Google AlphaEvolve Helps Lithography Firm Substrate Boost Computational Stack Efficiency by 680%

Substrate, a startup specializing in X-ray lithography technology, recently announced that it has optimized its computational lithography stack using Google DeepMind's AlphaEvolve programming agent.

By integrating AlphaEvolve, Substrate increased the speed of its computational lithography workloads by 680% in one month, reduced computing costs by 97%, and cut memory usage by 94%. Additionally, the agent enabled Substrate to achieve a 12nm feature size for bidirectional M1 metal interconnect layers in a single lithography step (on par with High NA EUV systems) and automatically explore hundreds of thousands of potential algorithm improvements.

Substrate stated that AlphaEvolve has made them realize that the co-evolution of models and chips is the future of computational intelligence.